Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting.
نویسندگان
چکیده
Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.
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ورودعنوان ژورنال:
- Nano letters
دوره 7 2 شماره
صفحات -
تاریخ انتشار 2007